CAS NO.37677-93-3 Cas:1,3-Bis(4-hydroxyphenyl)adamantane

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Product name：	1,3-Bis(4-hydroxyphenyl)adamantane
CAS NO.:	37677-93-3
Structure：
Synonyms:	4,4”-(1,3-ADAMANTANEDIYL)DIPHENOL;4,4”-(1,3-AdaMantanediyl)bisphenol;1,3-Bis(4-Hydroxyphenyl)AdaMantane;1,3-Bis(p-hydroxyphenyl)adamantane;Adamantate
MF:	C22H24O2
MW:	320.42
Melting point :	200-202 °C(lit.)
Chemical Properties:	Clear colorless liquid
Purity	98%
Capacity:	500KG /month
Package	In paper drums /Fluoride drums /iron drums /plastic drums/IBC Tank ,etc.
Shipment method :	By Sea ,Air ,Courier door to door ,etc.
Storeage:	Under room temperature ,keep away from direct sun light
Loading Port :	China any port ,Beijing ,Shanghai ,Hongkong
Transportation condition:	Shipped as non- dangerous chemicals
Application:	Analog Semiconductors, Light-Emitting Diodes LEDs, Solar Photovoltaics PV

Introduction

A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.

In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.

In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.

Based on the chemical structure of photoresists, they can be classified into three types: Photopolymeric, photodecomposing, photocrosslinking photoresist.

Photopolymeric photoresist is a type of photoresist, usually allyl monomer, which could generate free radical when exposed to light, then initiates the photopolymerization of monomer to produce a polymer. Photopolymeric photoresists are usually used for negative photoresist, e.g. methyl methacrylate.

Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer

Photodecomposing photoresist is a type of photoresist that generates hydrophilic products under light. Photodecomposing photoresists are usually used for positive photoresist.

Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.

Photocrosslinking photoresist is a type of photoresist, which could crosslink chain by chain when exposed to light, to generate an insoluble network. Photocrosslinking photoresist are usually used for negative photoresist.

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