5-Hydroxy-2,6-norbornane Carbolactone Cas:92343-46-9

We are 5-Hydroxy-2,6-norbornane Carbolactone CAS:92343-46-9 manufacturer and supplier in China, Pls send inquiry of to info@nbinno.com of visit www.nbinno.com our official website should you have any interests

Product name：	5-Hydroxy-2,6-norbornane carbolactone
CAS NO.:	92343-46-9
Structure：
Synonyms:	Nsc311957;2-Hydroxy-4-oxo-tricyclo[4.2.1.03.7]nonan-5-one;6-Hydroxyhexahydro-2H-3,5-Methanocyclopenta[b]furan-2-one;2-Hydroxy-4-oxa-tricyclo[4.2.1.0]nonan-5-one;5-Hydroxynorbornane 2,6-Lactone;N-hydroxy-5-norbornene-2,3-second imid;N-hydroxy-5-norbornene-2,3-second imide;5-Hydroxy-2,6-norbornane carbolactone
MF:	C8H10O3
MW:	154.164
Melting point :	156.0 to 160.0 °C
Chemical Properties:	White powder
Purity	98%
Capacity:	500KG /month
Package	In paper drums /Fluoride drums /iron drums /plastic drums/IBC Tank ,etc.
Shipment method :	By Sea ,Air ,Courier door to door ,etc.
Storeage:	Under room temperature ,keep away from direct sun light
Loading Port :	China any port ,Beijing ,Shanghai ,Hongkong
Transportation condition:	Shipped as non- dangerous chemicals
Application:	Analog Semiconductors, Light-Emitting Diodes LEDs, Solar Photovoltaics PV

Introduction

A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.

In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.

In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.

Based on the chemical structure of photoresists, they can be classified into three types: Photopolymeric, photodecomposing, photocrosslinking photoresist.

Photopolymeric photoresist is a type of photoresist, usually allyl monomer, which could generate free radical when exposed to light, then initiates the photopolymerization of monomer to produce a polymer. Photopolymeric photoresists are usually used for negative photoresist, e.g. methyl methacrylate.

Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer

Photodecomposing photoresist is a type of photoresist that generates hydrophilic products under light. Photodecomposing photoresists are usually used for positive photoresist.

Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.

Photocrosslinking photoresist is a type of photoresist, which could crosslink chain by chain when exposed to light, to generate an insoluble network. Photocrosslinking photoresist are usually used for negative photoresist.

The Related Products：CAS NO.92343-46-9 5-Hydroxy-2,6-norbornane carbolactone

1. 1-Adamantanecarboxylic acid CAS NO.42711-75-1

2. Methyl 1-adamantanecarboxylate CAS NO.711-01-3

3. 1-Adamantane-1-carboxylic acid CAS NO.828-51-3

Related Products:2-Allyloxy-benzaldehyde O-methyl-oxime manufacturer | 1-(1H-benzo[d]imidazol-2-yl)pyridin-2(1H)-one hydrochloride supplier | N,N-dimethyl-3-(6-methyldibenzo[c,e][1,2]azaborinin-5(6H)-yl)propan-1-amine producer.